Software Tool for Off-Line Semiconductor Metrology Measure software determines semiconductor feature dimensions from off-line SEM and optical images. It enables users and tool makers to extend the capability of their SEMs or optical microscopes. Measure has been developed under the auspices of SEMATECH International by Spectel Company which also offers a variety of software simulation and analysis programs that are used in semiconductor metrology applications. Process Engineering Application Measures linewidth, contact holes and corner rounding Performs shape analysis Sorts and compares measurement results Measures features and angles on cleaved cross-sectional specimens Estimates signal to noise ration for selected areas Determines Apparent Beam Width (Industry Standard for determining resolution) Magnification calibration Research and Development Application Enables evaluation of various algorithms for making calculations. Determines polynomial curve fits to line scans Produces sigmoid curve fits to line scans OEM Application Adds alignment and measurement capability Provides Frame Grabber interface Includes Results Database Furnishes image file management Features Auto alignment Optical pattern recognition Graphical and statistical analysis of measured data Measurement results database with query capability and analysis Database organization for Frame Grabber set-up information Pixel sizes calibration System Requirements Windows 95/98 or Windows NT ver. 3.5 or higher 64 Megabytes or more of RAM 1280 X 1024 pixel screen resolution Approximately 30 megabytes of free disk space System Specifications Provides support for "Data Translation" type Frame Grabbers including frame averaging Accepts images in TIF, JPG, BPM, TGA, Pict. etc. formats Includes TWAIN scanner support for input of images from photographs Automatically aligns when doing a measurment Furnishes Results Database query capability with flexible filters Has three user-defined edge-finding algorithms