Metrologia

Metrologia system software meets the semiconductor industry's need to maximize utilization of processing and diagnostic equipment through simulation of their operation. Modeling and characterization of electron beam and optical systems can contribute significantly to semiconductor manufacturing efficiency by accurately predicting results and enabling adjustments prior to running product. Metrologia simulation software produces simulated images for classical, confocal, coherence probe and SEM microscope as well as stepper aerial images. Prediction of thin film characteristics and modeling of diffraction gratings are additional Metrologia capabilities.

Optical Image Simulation

• Reflection and transmission
• Classical Brightfield and Darkfield Microscopes
• Confocal Microscope
• Coherence Probe Microscope
• Aerial Image of Steppers

SEM Monte Carlo Model

• Backscattered Electron Model
• Secondary Electron Model
• Transmission and Reflection Modes
• Material database
• Measurement of Simulated Data

Thin Film Characteristics

• Multilayer Film Stack Model
• Spectral, Angular, and Polarization Analysis and Graphs

Diffraction Grating Modeling

• Scatterometry Calculations for Grating Efficiencies and Phases
• Reciprocity Tests